Description

Concern for HVAC vibration and noise in semiconductor microchip fabrication clean rooms has taken on an added and an important dimension as a result of the smaller line widths used in the new high density products.

The adverse effects of equipment vibration in occupied structures are primarily annoyance and possible damages. However, control of vibration in a semiconductor clean room is even more critical. Vibration criterion for a Class 10 clean room is often expressed in microinches. The criterion for permissible vibration from HVAC equipment is usually expressed in mils. The location and type of the mechanical equipment and the structural characteristics of the floor are as important in vibration control as are the common products used in controlling vibration from mechanical equipment — vibration isolators.

The effect of high noise levels on employees’ morale and productivity is likewise well known, and there are acceptable criteria . High noise levels can also excessively vibrate the sensitive process equipment directly through the air, even when the floor does not vibrate.

Units: SI

Citation: Symposium, ASHRAE Transactions, 1986, vol. 92, pt. 1B, San Francisco

Product Details

Published:

1986

Number of Pages:

10

File Size:

1 file , 1 MB

Product Code(s):

D-SF-86-06-3